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Metallurgical Microscope LMM-C10

Metallurgical Microscope LMM-C10 is specifically designed for industrial purpose. Features superior quality Infinity M Plan APO HL objective (visible) with long working distance, double layer stage, trinocular head, rotatable analyzer, filters namely blue and green, quintuple nosepiece etc. which makes it highly efficient and reliable. It has wide applications in metal industry, mineral industry and electrical industry.

Metallurgical Microscope LMM-C10

Optical System Infinity Optical System F= 200 mm
Viewing Head Siedentopf trinocular head, inclined at 30°, Interpupillary 55-75 mm
Eyepiece WF10X/25 mm
Objective
M Plan APO HL Objective 2X/0.055 WD= 34.56 mm Focus Length 95mm
M Plan APO HL Objective 5X/0.14 WD= 44.50 mm Focus Length 95mm
M Plan APO HL Objective 10X/0.28 WD= 34.00 mm Focus Length 95mm
M Plan APO HL Objective 20X/0.29 WD= 31.00 mm Focus Length 95mm
M Plan APO HL Objective 50X/0.42 WD= 20.50 mm Focus Length 95mm
Nosepiece Quintuple, objective screw M26×0.706
Stage Double layers stage 230×280 mm
moving range: 150×150 mm
Filter Green, Blue, Neutral
Focusing Coaxial coarse and fine with rack and pinion, coarse range 40 mm, fine scale value 0.002 mm
Illumination Reflected halogen 12 V 50 W, Adjustable, with aperture and field iris diaphragm
Polarizing Analyzer rotatable 360°
polarizer and analyzer can be moved out/in
Optional Material Plus Software
Dimension 540×580×530 mm
Weight 39.1 kg

  • Infinity Optical system
    Adopts M Plan APO HL objective (visible)
    M Plan APO HL objective (NIR and NUV) is optional
    Long working distance objective
    Quintuple nosepiece
    Green, blue, neutral filter
    Movable polarizer and analyser
    Positive and Negative imaging is customisable
    Options like automatic focusing, motorised stage and auto nosepiece are available
    Software can also be provided

It is used to inspect semiconductor chips, integrated circuits, structures of metals and alloys etc.

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